Together with the rapid development of the electronics and other precision industries, sputtering process and vapor-deposition process are being used in a diversity of fields for the production of the required thin films.
Based on manufacturing experience in magnetic and other electronics materials, Hitachi Metals offers unique sputtering target materials, thus responding to increasing demand for a variety of applications.
Semiconductors
We offer high-purity Ti Target with a uniform and fine crystallized microstructure (Grain size: less than 10m) for LSI barrier metals. It is capable of providing large dimensions.
Magnetic Recording
In response to increasing recording densities, we provide unique high quality targets for various magnetic recording media and magnet heads.
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Key Benefit
An Edge in Quality
Available for large scale material, Hitachi target material has a fine uniform microstructure which allows a higher purity and density.
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